
Amorphous MoSi Superconducting Thin Films: Scaling Quantum Fabrication Without the Crystal Lattice
Researchers have demonstrated a scalable method for depositing amorphous molybdenum silicide on nanowires, achieving a critical temperature of 7.25 K via magnetron co-sputtering. By abandoning rigid crystalline structures, the study suggests a more efficient, defect-tolerant path for fabricating quantum electronic components.
By Dipane, Zubkins, Kunakova, Dipans, Yager, Polyakov, Butanovs



